缩写名/全名 |
MICROELECTRON ENG
MICROELECTRONIC ENGINEERING |
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ISSN号 | 0167-9317 | ||||||||||||||||||||||||||||||||
研究方向 | 工程技术-工程:电子与电气 | ||||||||||||||||||||||||||||||||
影响因子 | 2015:1.277, 2016:1.806, 2017:2.02, 2018:1.654, 2019:2.305, | ||||||||||||||||||||||||||||||||
出版国家 | NETHERLANDS | ||||||||||||||||||||||||||||||||
出版周期 | Monthly | ||||||||||||||||||||||||||||||||
年文章数 | 225 | ||||||||||||||||||||||||||||||||
出版年份 | 1983 | ||||||||||||||||||||||||||||||||
是否OA | No | ||||||||||||||||||||||||||||||||
审稿周期(仅供参考) | 平均6.0个月 |
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录用比例 | 容易 | ||||||||||||||||||||||||||||||||
投稿链接 | http://ees.elsevier.com/mee/ | ||||||||||||||||||||||||||||||||
投稿官网 | http://www.journals.elsevier.com/microelectronic-engineering/ | ||||||||||||||||||||||||||||||||
h-index | 89 | ||||||||||||||||||||||||||||||||
CiteScore |
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PubMed Central (PMC)链接 | http://www.ncbi.nlm.nih.gov/nlmcatalog?term=0167-9317%5BISSN%5D | ||||||||||||||||||||||||||||||||
中科院SCI期刊分区 ( 2018年新版本) |
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中科院SCI期刊分区 ( 2020年新版本) |
中国学者近期发表的论文 | |
1. | Microsystems using three-dimensional integration and TSV technologies: Fundamentals and applications Author: Zheyao Wang Journal: MICROELECTRONIC ENGINEERING, 2019, Vol., , DOI:10.1016/j.mee.2019.03.009 DOI |
2. | Electrically modulated adhesive hydrophobicity for patterning various microstructures Author: Xiangmeng Li, Huifen Wei, Xijing Zhu Journal: MICROELECTRONIC ENGINEERING, 2019, Vol.209, 1-5, DOI:10.1016/j.mee.2019.02.008 DOI |
3. | A theoretical study of gating effect on InP-InGaAs HEMTs by tri-layer T–shape gate Author: Jianan Deng, Jinhai Shao, Jing Wan, Bingrui Lu, Yifang Chen Journal: MICROELECTRONIC ENGINEERING, 2019, Vol.208, 54-59, DOI:10.1016/j.mee.2019.02.004 DOI |
4. | Enhancement of hardness of bulk solder by doping Cu nanoparticles at the interface of Sn/Cu solder joint Author: Shengyan Shang, Yanfeng Wang, Yunpeng Wang, Haitao Ma, Anil Kunwar Journal: MICROELECTRONIC ENGINEERING, 2019, Vol.208, 47-53, DOI:10.1016/j.mee.2019.01.009 DOI |
5. | Microfluidics with new multi-stage arc-unit structures for size-based cross-flow separation of microparticles Author: Yee-Ting Lee, Chaobin Dang, Sihui Hong, An-Shik Yang, Tsai-Lung Su, Yung-Chun Yang Journal: MICROELECTRONIC ENGINEERING, 2019, Vol.207, 37-49, DOI:10.1016/j.mee.2019.01.005 DOI |
6. | Flexible UWB antenna fabricated on polyimide substrate by surface modification and in situ self-metallization technique Author: Zhiliang Wang, Lin Qin, Qingyue Chen, Wenwen Yang, Huiwen Qu Journal: MICROELECTRONIC ENGINEERING, 2019, Vol.206, 12-16, DOI:10.1016/j.mee.2018.12.006 DOI |
7. | UV-curable nanoimprint resist with liquid volume-expanding monomers Author: Haodi Min, Nan Zheng, Zengju Fan, Youwei Jiang, Xing Cheng Journal: MICROELECTRONIC ENGINEERING, 2018, Vol.205, 32-36, DOI:10.1016/j.mee.2018.10.011 DOI |
8. | Improved Ti germanosilicidation by Ge pre-amorphization implantation (PAI) for advanced contact technologies Author: Shujuan Mao, Guilei Wang, Jing Xu, Dan Zhang, Xue Luo, Wenwu Wang, Dapeng Chen, Junfeng Li, Anyan Du, Chao Zhao, Tianchun Ye, Jun Luo Journal: MICROELECTRONIC ENGINEERING, 2018, Vol.201, 1-5, DOI:10.1016/j.mee.2018.09.006 DOI |
9. | Application of surfactant for facilitating benzotriazole removal and inhibiting copper corrosion during post-CMP cleaning Author: Jiying Tang, Yuling Liu, Chenwei Wang, Xinhuan Niu, Baimei Tan, Baohong Gao Journal: MICROELECTRONIC ENGINEERING, 2018, Vol.202, 1-8, DOI:10.1016/j.mee.2018.09.005 DOI |
10. | Investigation of reflective performance for micro-pyramid arrays by roll-to-roll UV imprinting process Author: Hao Wu, Jie Gao, Peiyun Yi, Linfa Peng, Xinmin Lai Journal: MICROELECTRONIC ENGINEERING, 2017, Vol.182, 61-67, DOI:10.1016/j.mee.2017.09.004 DOI |
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